Title :
RIBE micro-fabrication of semiconductor photonic devices for micro-photonic integrated circuits
Author :
Koyama, F. ; Mitsugi, S. ; Kato, J. ; Matsutani, A. ; Suzuki, K. ; Mukaihara, T. ; Iga, Kenichi
Author_Institution :
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
fDate :
31 Oct-3 Nov 1994
Abstract :
The authors present the reactive ion beam etching (RIBE) micro fabrication of miniature photonic devices, such as micro ring lasers, corner reflector arrays and star couplers. The key issue is to develop nanometer semiconductor fabrication processes with low induced damages. The proposed concept might be helpful for the size reduction in large scale integrated photonics
Keywords :
optical fabrication; RIBE micro-fabrication; corner reflector arrays; large scale integrated photonics; low induced damages; micro ring lasers; micro-photonic integrated circuits; miniature photonic devices; nanometer semiconductor fabrication processes; reactive ion beam etching; semiconductor photonic devices; size reduction; star couplers; Couplers; Diffraction; Etching; Optical arrays; Photonic integrated circuits; Ring lasers; Semiconductor laser arrays; Semiconductor lasers; Surface emitting lasers; Threshold current;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1994. LEOS '94 Conference Proceedings. IEEE
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-1470-0
DOI :
10.1109/LEOS.1994.586551
