DocumentCode :
3486251
Title :
Partial lifetime control in IGBT by helium irradiation through mask patterns
Author :
Akiyama, Hajime ; Harada, Masana ; Kondoh, Hisao ; Akasaka, Yoichi
Author_Institution :
Mitsubishi Electr. Corp., Itami, Japan
fYear :
1991
fDate :
22-24 Apr 1991
Firstpage :
187
Lastpage :
191
Abstract :
Partial lifetime control for IGBTs (insulated-gate bipolar transistors) performed by irradiated helium ions through a stainless steel mask is studied. This control technique localizes the presence of carrier recombination centers in the lateral direction as well as in depth profile. Using this technique, one can obtain better trade-off curves between on-state voltage and turn-off loss compared with maskless irradiation. Turn-off loss is reduced to 41% of that in the case of maskless irradiation at the same on-state voltage
Keywords :
carrier lifetime; insulated gate bipolar transistors; ion beam effects; masks; He ions; IGBTs; carrier recombination centers; depth profile; lateral direction; mask patterns; maskless irradiation; on-state voltage; partial lifetime control; stainless steel mask; turn-off loss; Charge carrier lifetime; Electrons; Helium; Insulated gate bipolar transistors; Large scale integration; Performance loss; Protons; Spontaneous emission; Steel; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 1991. ISPSD '91., Proceedings of the 3rd International Symposium on
Conference_Location :
Baltimore, MD
ISSN :
1063-6854
Print_ISBN :
0-7803-0009-2
Type :
conf
DOI :
10.1109/ISPSD.1991.146095
Filename :
146095
Link To Document :
بازگشت