DocumentCode
3486367
Title
Delay-optimal simultaneous technology mapping and placement with applications to timing optimization
Author
Liu, Yifang ; Shelar, Rupesh S. ; Hu, Jiang
Author_Institution
Dept. of ECE, Texas A&M Univ., College Station, TX
fYear
2008
fDate
10-13 Nov. 2008
Firstpage
101
Lastpage
106
Abstract
Technology mapping and placement have significant impact on the delays in standard cell based very large scale integrated (VLSI) circuits. Traditionally, these steps are applied separately to optimize delays, possibly since efficient algorithms that allow the simultaneous exploration of the mapping and placement solution spaces are unknown. In this paper, we present an exact polynomial time algorithm for delay-optimal placement of a tree and extend the same to simultaneous technology mapping and placement for optimal delay in the tree. We extend the algorithm by employing Lagrangian relaxation technique, which assesses the timing criticality of paths beyond a tree, to optimize the delays in directed acyclic graphs (DAGs). Experimental results on benchmark circuits in a 70 nm technology show that our algorithms improve timing significantly with remarkably less run-times compared to a competitive approach of iterative conventional timing driven mapping and multi-level placement.
Keywords
VLSI; delays; directed graphs; iterative methods; polynomials; trees (mathematics); Lagrangian relaxation technique; VLSI circuit; delay-optimal placement; delay-optimal simultaneous technology mapping; directed acyclic graphs; exact polynomial time algorithm; iterative conventional timing driven mapping; multilevel placement; size 70 nm; standard cell based very large scale integrated circuit; timing optimization; Delay effects; Integrated circuit technology; Iterative algorithms; Lagrangian functions; Polynomials; Simultaneous localization and mapping; Space technology; Timing; Tree graphs; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer-Aided Design, 2008. ICCAD 2008. IEEE/ACM International Conference on
Conference_Location
San Jose, CA
ISSN
1092-3152
Print_ISBN
978-1-4244-2819-9
Electronic_ISBN
1092-3152
Type
conf
DOI
10.1109/ICCAD.2008.4681558
Filename
4681558
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