DocumentCode :
3486367
Title :
Delay-optimal simultaneous technology mapping and placement with applications to timing optimization
Author :
Liu, Yifang ; Shelar, Rupesh S. ; Hu, Jiang
Author_Institution :
Dept. of ECE, Texas A&M Univ., College Station, TX
fYear :
2008
fDate :
10-13 Nov. 2008
Firstpage :
101
Lastpage :
106
Abstract :
Technology mapping and placement have significant impact on the delays in standard cell based very large scale integrated (VLSI) circuits. Traditionally, these steps are applied separately to optimize delays, possibly since efficient algorithms that allow the simultaneous exploration of the mapping and placement solution spaces are unknown. In this paper, we present an exact polynomial time algorithm for delay-optimal placement of a tree and extend the same to simultaneous technology mapping and placement for optimal delay in the tree. We extend the algorithm by employing Lagrangian relaxation technique, which assesses the timing criticality of paths beyond a tree, to optimize the delays in directed acyclic graphs (DAGs). Experimental results on benchmark circuits in a 70 nm technology show that our algorithms improve timing significantly with remarkably less run-times compared to a competitive approach of iterative conventional timing driven mapping and multi-level placement.
Keywords :
VLSI; delays; directed graphs; iterative methods; polynomials; trees (mathematics); Lagrangian relaxation technique; VLSI circuit; delay-optimal placement; delay-optimal simultaneous technology mapping; directed acyclic graphs; exact polynomial time algorithm; iterative conventional timing driven mapping; multilevel placement; size 70 nm; standard cell based very large scale integrated circuit; timing optimization; Delay effects; Integrated circuit technology; Iterative algorithms; Lagrangian functions; Polynomials; Simultaneous localization and mapping; Space technology; Timing; Tree graphs; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computer-Aided Design, 2008. ICCAD 2008. IEEE/ACM International Conference on
Conference_Location :
San Jose, CA
ISSN :
1092-3152
Print_ISBN :
978-1-4244-2819-9
Electronic_ISBN :
1092-3152
Type :
conf
DOI :
10.1109/ICCAD.2008.4681558
Filename :
4681558
Link To Document :
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