Development of ECR sheet plasma source for ion-enhanced reactive sputter deposition

Author

Wakatsuchi, M. ; Ishii, S. ; Kato, Y. ; Sunagawa, M. ; Tani, F.

Author_Institution

Dept. of Electron. & Inf., Toyama Prefectural Univ., Japan

fYear

1996

fDate

16-21 Jun 1996

Firstpage

800

Lastpage

803

Abstract

An ECR plasma source is developed to generate rectilinearly uniform plasmas 20 cm in width. The source consists of a pair of permanent magnets and a slot antenna (slotted waveguide). The poles of the magnets face oppositely each other and a line cusp field is generated in a vacuum chamber. The antenna is set in between the magnets. Uniform O₂ plasmas are obtained in the range of 20 cm. The source is combined with a magnetron sputtering cathode and applies to ion-enhanced reactive sputtering deposition. Films of TiO₂ are deposited for optical coatings. Refractive index of 2.5 is obtained by reactive sputtering in the oxygen ECR plasma. The deposition rate increased by a factor of four with O₂/Ar mixing gas

Keywords

optical films; plasma deposition; plasma production; refractive index; sputter deposition; titanium compounds; 20 cm; ECR sheet plasma source; O₂; TiO₂; TiO₂ film; ion-enhanced reactive sputter deposition; line cusp field; magnetron sputtering cathode; optical coating; permanent magnet; refractive index; slot antenna; slotted waveguide; Cathodes; Optical films; Optical mixing; Optical refraction; Optical waveguides; Permanent magnets; Plasma sources; Plasma waves; Slot antennas; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology. Proceedings of the 11th International Conference on

Conference_Location

Austin, TX

Print_ISBN

0-7803-3289-X

Type

conf

DOI

10.1109/IIT.1996.586582

Filename

586582