DocumentCode
3487291
Title
Refractive index of AlInGaAs layers in the transparent wavelength region
Author
Dejun, Han ; Chan, K.T.
Author_Institution
Dept. of Electron. Eng., Chinese Univ. of Hong Kong, Shatin, Hong Kong
Volume
2
fYear
1994
fDate
31 Oct-3 Nov 1994
Firstpage
349
Abstract
Compared with InGaAsP as an optical material system, AlInGaAs possesses advantages like (l) a larger conduction band offset that improves electron confinement; (2) a smaller valence-band discontinuity that alleviates the hole capture problem, resulting in a more efficient carrier sweep out; (3) AlInGaAs is better suited for the realization of continuous graded index separate-confinement-heterostructure (GRIN-SCH) lasers, where very efficient carrier capture process in a thin quantum well active layer has been demonstrated. Although all the devices mentioned above incorporate layers of AllnGaAs, little is known about their refractive index which is essential to optimize those devices. This paper calculates this refractive index in the transparent wavelength region
Keywords
refractive index; AlInGaAs; AlInGaAs layers; optical material; refractive index; transparent wavelength region; Artificial intelligence; Conducting materials; Dielectric constant; Dielectric materials; Free electron lasers; Indium phosphide; Optical device fabrication; Optical materials; Quantum well devices; Refractive index;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1994. LEOS '94 Conference Proceedings. IEEE
Conference_Location
Boston, MA
Print_ISBN
0-7803-1470-0
Type
conf
DOI
10.1109/LEOS.1994.586610
Filename
586610
Link To Document