DocumentCode :
3487385
Title :
Application of dielectric isolation technology based on soot bonding
Author :
Sawada, R. ; Nakada, H.
Author_Institution :
NTT Appl. Electron. Lab., Tokyo, Japan
fYear :
1991
fDate :
22-24 Apr 1991
Firstpage :
203
Lastpage :
208
Abstract :
A soot bonding method has been developed that solves the economic and limited-diameter problems associated with the conventional dielectrically isolated substrate. In this method, the Si-B-O soot particles used as adhesive agents are generated by essentially the same flame-hydrolysis technology used for fabricating optical waveguides. This soot bonding method is effective even for joining a surface with deep V-grooves or trenches, as well as for rough poly-Si-deposited surfaces. The ability to bond substrates with any joining surface conditions is expected to lead to wide application of this process and to a reduction of the steps, resulting in cost reduction
Keywords :
integrated circuit technology; large scale integration; surface treatment; deep V-grooves; deep trenches; dielectric isolation technology; flame-hydrolysis technology; joining surface conditions; limited-diameter problems; polysilicon-deposited surfaces; soot bonding; Bonding; Costs; Dielectric substrates; Glass; Isolation technology; Optical surface waves; Rough surfaces; Surface roughness; Thermal conductivity; Vitrification;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 1991. ISPSD '91., Proceedings of the 3rd International Symposium on
Conference_Location :
Baltimore, MD
ISSN :
1063-6854
Print_ISBN :
0-7803-0009-2
Type :
conf
DOI :
10.1109/ISPSD.1991.146100
Filename :
146100
Link To Document :
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