DocumentCode :
3488511
Title :
Thin film VCSEL assembly on CMOS IC using ELO and nano paste metallization
Author :
Kondo, Taka-Yuki ; Kitamura, Shojiro ; Nimura, Yoshihiko ; Kaneko, Takeo ; Shimoda, Tatsuya
Author_Institution :
Seiko Epson Corp., Nagano, Japan
fYear :
2004
fDate :
28-30 June 2004
Firstpage :
11
Lastpage :
12
Abstract :
In this work, we present the enhancement of previous work by monolithically appearance assembly using nano paste metallization on IC with Au plated pads and higher frequency operation. We have demonstrated the assembly of thin film VCSEL on CMOS laser driver IC in monolithically dimension. ELO (epitaxial liftoff) technique, polyimide bonding and nano paste metallization with Au plated pads were used for this work. The modulation of light output from thin film VCSEL at 2.5 Gbps was achieved.
Keywords :
CMOS integrated circuits; gold; integrated optoelectronics; laser cavity resonators; optical fabrication; optical films; optical modulation; semiconductor device metallisation; semiconductor epitaxial layers; surface emitting lasers; 2.5 Gbit/s; Au; Au plated pads; CMOS laser driver IC; ELO; epitaxial liftoff; light modulation; monolithical assembly; nano paste metallization; polyimide bonding; thin film VCSEL assembly; Assembly; Bonding; CMOS integrated circuits; Frequency; Gold; Metallization; Monolithic integrated circuits; Polyimides; Transistors; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004 Digest of the LEOS Summer Topical Meetings
ISSN :
1099-4742
Print_ISBN :
0-7803-8306-0
Type :
conf
DOI :
10.1109/LEOSST.2004.1338680
Filename :
1338680
Link To Document :
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