DocumentCode
3489816
Title
High efficiency embedded decoupling capacitors for MCM applications
Author
Tesson, O. ; Le Cornec, F. ; Jacqueline, S.
Author_Institution
NXP Semicond., Caen
fYear
2008
fDate
15-19 Sept. 2008
Firstpage
262
Lastpage
265
Abstract
In this paper, RF characterization results of decoupling capacitors embedded in high resistivity silicon (HRS) substrate are reported. First, an innovative 3-D architecture suitable for silicon processes is decribed. Then, RF characterization results are analyzed based on capacitance values as well as ESR (estimated serial resistance) and ESL (estimated serial inductance) extraction. Results clearly show that devices reach a very low level of impedance together with low parasitic inductance in millimeter wave domain. A predictive electrical model composed of a cascade of T elements is derived from measurements and optimised to figure-out the distributed nature of the capacitance. Correlations between measurements and simulation data are found satisfactory.
Keywords
MOS capacitors; electrical resistivity; elemental semiconductors; inductance; silicon; MCM applications; RF characterization; Si; capacitance; decoupling capacitors; estimated serial inductance; estimated serial resistance; high efficiency embedded decoupling capacitors; high resistivity silicon substrate; Capacitors; Conductivity; Electric resistance; Impedance; Inductance; Millimeter wave measurements; Paramagnetic resonance; Parasitic capacitance; Radio frequency; Silicon; Capacitors; Deep Reactive Ion-Etching (DRIE); Device architecture; Integration of Passive Devices (IPD); Multi-Chip Module (MCM); RF characterization; modelling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2008. ESSDERC 2008. 38th European
Conference_Location
Edinburgh
ISSN
1930-8876
Print_ISBN
978-1-4244-2363-7
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2008.4681748
Filename
4681748
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