• DocumentCode
    3491205
  • Title

    Fabrication and testing of 980nm high-power VCSEL with AlN film passivation layer

  • Author

    Hou, Lifeng ; Ma, Yongfeng ; Feng, Yuan

  • Author_Institution
    Dept. of Electron. Eng., Changchun Eng. Tech. Inst. Changchun, Changchun, China
  • fYear
    2012
  • fDate
    23-25 Aug. 2012
  • Firstpage
    45
  • Lastpage
    48
  • Abstract
    We report the fabrication and the testing of a novel high-power VCSEL with AlN film passivation layer in this paper. The analysis on the high-power VCSEL show that the AlN film passivation layer can improve the opto-electric characteristics of high-power VCSEL, reduce the thermal resistance of VCSEL and enhance the ability of the heat dissipation; The AlN film passivation layer and the SiO2 film passivation layer high-power VCSEL both with the same aperture have been made by the same processes on the same epitaxial wafer; the two kinds of high power VCSEL have been tested comparatively, the testing results show that the out power of the VCSEL on AlN film passivation layer is 470mW at room temperature, its characteristic temperature is 120K, it have the much better temperature and opto-electric characteristics than the device on the SiO2 film passivation layer.
  • Keywords
    III-V semiconductors; aluminium compounds; cooling; laser beams; laser cavity resonators; optical fabrication; optical testing; passivation; quantum well lasers; semiconductor epitaxial layers; silicon compounds; surface emitting lasers; thermal resistance; wide band gap semiconductors; AlN; SiO2; characteristic temperature; epitaxial wafer; film passivation layer; heat dissipation; high-power VCSEL; laser out power; optical fabrication; optical testing; opto-electric characteristics; power 470 mW; temperature 120 K; temperature 293 K to 298 K; thermal resistance; wavelength 980 nm; Conductivity; Films; Heating; Passivation; Temperature; Threshold current; Vertical cavity surface emitting lasers; AIN; VCSEL; high-power; passivation layer; semiconductorlaser;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronics and Microelectronics (ICOM), 2012 International Conference on
  • Conference_Location
    Changchun, Jilin
  • Print_ISBN
    978-1-4673-2638-4
  • Type

    conf

  • DOI
    10.1109/ICoOM.2012.6316212
  • Filename
    6316212