• DocumentCode
    3491574
  • Title

    Investigation of refractive index antiguiding structure for asymmetric heterostructure semiconductor laser

  • Author

    Zhang, Yue ; Li, Te ; Chen, Rong ; Wang, Yuzhi ; Liu, Guojun ; Hao, Erjuan

  • Author_Institution
    Nat. Key Lab. on High Power Semicond. Lasers, Changchun Univ. of Sci. & Technol., Changchun, China
  • fYear
    2012
  • fDate
    23-25 Aug. 2012
  • Firstpage
    128
  • Lastpage
    132
  • Abstract
    Anti-guiding layers of asymmetric heterostructure for 100μm-wide-strip GaAs/AlGaAs quantum-well semiconductor lasers emitting at a wavelength of 808 nm are analyzed and calculated theoretically. Choosing three cases of Al-content of antiguiding layer in the active region [containing quantum well (QW) and waveguides], we calculate and analyze the dependences of optical confinement factor, threshold current, maximal output power and vertical beam divergence angle on the thickness of the antiguiding layer, separately. According to the results, when the thickness of antiguiding layer is constant, the higher the Al-content is the greater on performance of device is; when the Al-content in antiguiding layer is constant, the effect on performance of device enlarged with the increase of thickness of antiguiding layer.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; laser beams; quantum well lasers; refractive index; waveguide lasers; GaAs-AlGaAs; active region; antiguiding layer thickness; asymmetric heterostructure semiconductor laser; device performance; maximal output power; optical confinement factor; quantum-well semiconductor lasers; refractive index antiguiding structure; size 100 mum; threshold current; vertical beam divergence angle; waveguides; wavelength 808 nm; Integrated optics; Optical pumping; Optical refraction; Optical variables control; Optical waveguides; Power generation; Semiconductor lasers; antiguing structure; asymmetric heterostructure; high power 808nm laser;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronics and Microelectronics (ICOM), 2012 International Conference on
  • Conference_Location
    Changchun, Jilin
  • Print_ISBN
    978-1-4673-2638-4
  • Type

    conf

  • DOI
    10.1109/ICoOM.2012.6316233
  • Filename
    6316233