DocumentCode :
3491574
Title :
Investigation of refractive index antiguiding structure for asymmetric heterostructure semiconductor laser
Author :
Zhang, Yue ; Li, Te ; Chen, Rong ; Wang, Yuzhi ; Liu, Guojun ; Hao, Erjuan
Author_Institution :
Nat. Key Lab. on High Power Semicond. Lasers, Changchun Univ. of Sci. & Technol., Changchun, China
fYear :
2012
fDate :
23-25 Aug. 2012
Firstpage :
128
Lastpage :
132
Abstract :
Anti-guiding layers of asymmetric heterostructure for 100μm-wide-strip GaAs/AlGaAs quantum-well semiconductor lasers emitting at a wavelength of 808 nm are analyzed and calculated theoretically. Choosing three cases of Al-content of antiguiding layer in the active region [containing quantum well (QW) and waveguides], we calculate and analyze the dependences of optical confinement factor, threshold current, maximal output power and vertical beam divergence angle on the thickness of the antiguiding layer, separately. According to the results, when the thickness of antiguiding layer is constant, the higher the Al-content is the greater on performance of device is; when the Al-content in antiguiding layer is constant, the effect on performance of device enlarged with the increase of thickness of antiguiding layer.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; laser beams; quantum well lasers; refractive index; waveguide lasers; GaAs-AlGaAs; active region; antiguiding layer thickness; asymmetric heterostructure semiconductor laser; device performance; maximal output power; optical confinement factor; quantum-well semiconductor lasers; refractive index antiguiding structure; size 100 mum; threshold current; vertical beam divergence angle; waveguides; wavelength 808 nm; Integrated optics; Optical pumping; Optical refraction; Optical variables control; Optical waveguides; Power generation; Semiconductor lasers; antiguing structure; asymmetric heterostructure; high power 808nm laser;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronics and Microelectronics (ICOM), 2012 International Conference on
Conference_Location :
Changchun, Jilin
Print_ISBN :
978-1-4673-2638-4
Type :
conf
DOI :
10.1109/ICoOM.2012.6316233
Filename :
6316233
Link To Document :
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