DocumentCode
3491574
Title
Investigation of refractive index antiguiding structure for asymmetric heterostructure semiconductor laser
Author
Zhang, Yue ; Li, Te ; Chen, Rong ; Wang, Yuzhi ; Liu, Guojun ; Hao, Erjuan
Author_Institution
Nat. Key Lab. on High Power Semicond. Lasers, Changchun Univ. of Sci. & Technol., Changchun, China
fYear
2012
fDate
23-25 Aug. 2012
Firstpage
128
Lastpage
132
Abstract
Anti-guiding layers of asymmetric heterostructure for 100μm-wide-strip GaAs/AlGaAs quantum-well semiconductor lasers emitting at a wavelength of 808 nm are analyzed and calculated theoretically. Choosing three cases of Al-content of antiguiding layer in the active region [containing quantum well (QW) and waveguides], we calculate and analyze the dependences of optical confinement factor, threshold current, maximal output power and vertical beam divergence angle on the thickness of the antiguiding layer, separately. According to the results, when the thickness of antiguiding layer is constant, the higher the Al-content is the greater on performance of device is; when the Al-content in antiguiding layer is constant, the effect on performance of device enlarged with the increase of thickness of antiguiding layer.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; laser beams; quantum well lasers; refractive index; waveguide lasers; GaAs-AlGaAs; active region; antiguiding layer thickness; asymmetric heterostructure semiconductor laser; device performance; maximal output power; optical confinement factor; quantum-well semiconductor lasers; refractive index antiguiding structure; size 100 mum; threshold current; vertical beam divergence angle; waveguides; wavelength 808 nm; Integrated optics; Optical pumping; Optical refraction; Optical variables control; Optical waveguides; Power generation; Semiconductor lasers; antiguing structure; asymmetric heterostructure; high power 808nm laser;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronics and Microelectronics (ICOM), 2012 International Conference on
Conference_Location
Changchun, Jilin
Print_ISBN
978-1-4673-2638-4
Type
conf
DOI
10.1109/ICoOM.2012.6316233
Filename
6316233
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