• DocumentCode
    349281
  • Title

    Microlens fabrication using Cl2/Ar CAIBE optimized by 2 level factorial design of experiments (DOE)

  • Author

    Yu, J.S. ; Yang, S.K. ; Choo, A.G. ; Kim, T.I.

  • Author_Institution
    Samsung Adv. Inst. of Technol., Suwon, South Korea
  • Volume
    1
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    102
  • Abstract
    A new microlens fabrication method using Cl2-Ar chemically assisted ion beam etching (CAIBE) was presented. Smooth lens surface and shorter etching time were the main advantages over the conventional Ar ion beam etching (IBE). The optimum etching parameters were determined using 2-level factorial diffractive optical elements (DOE)
  • Keywords
    argon; chlorine; design of experiments; diffractive optical elements; ion beam assisted deposition; microlenses; optical fabrication; sputter etching; 2 level factorial design of experiments; 2-level factorial diffractive optical elements; Ar ion beam etching; Cl2-Ar; Cl2/Ar CAIBE; Cl2/Ar chemically assisted ion beam etching; etching time; microlens fabrication; optimum etching parameters; smooth lens surface; Argon; Chemicals; Etching; Identity-based encryption; Ion beams; Lenses; Microoptics; Optical device fabrication; Optical diffraction; Particle beam optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    LEOS '99. IEEE Lasers and Electro-Optics Society 1999 12th Annual Meeting
  • Conference_Location
    San Francisco, CA
  • ISSN
    1092-8081
  • Print_ISBN
    0-7803-5634-9
  • Type

    conf

  • DOI
    10.1109/LEOS.1999.813497
  • Filename
    813497
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=349281