Author :
Defaÿ, Emmanuel ; Wolozan, David ; Garrec, Pierre ; André, Bernard ; Ulmer, Laurent ; Aïd, Marc ; Blanc, Jean-Pierre ; Serret, Emmanuelle ; Delpech, Philippe ; Giraudin, Jean-Christophe ; Guillan, Julie ; Pellissier, Denis ; Ancey, Pascal
Keywords :
BiCMOS integrated circuits; MIM devices; high-k dielectric thin films; strontium compounds; thin film capacitors; titanium compounds; BiCMOS integrated circuit; SrTiO3; coupling capacitors; high-k MIM capacitors; Annealing; Capacitance; Crystallization; Dielectric constant; Dielectric materials; Ferroelectric materials; High K dielectric materials; High-K gate dielectrics; MIM capacitors; Sputtering;