DocumentCode :
349443
Title :
Angular distribution of cluster atoms due to cluster impact
Author :
Muramoto, T. ; Yorizane, K. ; Yamamura, Y.
Author_Institution :
Fac. of Inf., Okayama Univ., Japan
Volume :
2
fYear :
1999
fDate :
36495
Firstpage :
799
Abstract :
The high-density effect on the angular distribution of penetrating cluster atoms due to cluster impacts on solid surfaces has been studied by molecular dynamics simulations. MD simulations are performed for (Cu) 201→Pt(111) and (Pt)201→Cu(111) where the cluster energies are changed from 5 eV to 50 keV per atom. It is found that the high-density formation is strongly dependent on the cluster energy and the mass ratio between a cluster atom and target atom and that the angular distributions of cluster atom are enhanced near θ=90° for 5 eV/atom Cu cluster
Keywords :
copper; impurity distribution; ion implantation; ion-surface impact; metal clusters; molecular dynamics method; platinum; 5 eV to 50 keV; Cu; Cu:Pt; Pt; Pt:Cu; angular distribution; cluster impact; high-density effect; ion implantation; molecular dynamics simulations; penetrating cluster atoms; solid surfaces; Application software; Atomic measurements; Computational modeling; Computer simulation; Informatics; Ion implantation; Smoothing methods; Solid modeling; Sputtering; Surface cleaning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
Type :
conf
DOI :
10.1109/IIT.1998.813788
Filename :
813788
Link To Document :
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