• DocumentCode
    349443
  • Title

    Angular distribution of cluster atoms due to cluster impact

  • Author

    Muramoto, T. ; Yorizane, K. ; Yamamura, Y.

  • Author_Institution
    Fac. of Inf., Okayama Univ., Japan
  • Volume
    2
  • fYear
    1999
  • fDate
    36495
  • Firstpage
    799
  • Abstract
    The high-density effect on the angular distribution of penetrating cluster atoms due to cluster impacts on solid surfaces has been studied by molecular dynamics simulations. MD simulations are performed for (Cu) 201→Pt(111) and (Pt)201→Cu(111) where the cluster energies are changed from 5 eV to 50 keV per atom. It is found that the high-density formation is strongly dependent on the cluster energy and the mass ratio between a cluster atom and target atom and that the angular distributions of cluster atom are enhanced near θ=90° for 5 eV/atom Cu cluster
  • Keywords
    copper; impurity distribution; ion implantation; ion-surface impact; metal clusters; molecular dynamics method; platinum; 5 eV to 50 keV; Cu; Cu:Pt; Pt; Pt:Cu; angular distribution; cluster impact; high-density effect; ion implantation; molecular dynamics simulations; penetrating cluster atoms; solid surfaces; Application software; Atomic measurements; Computational modeling; Computer simulation; Informatics; Ion implantation; Smoothing methods; Solid modeling; Sputtering; Surface cleaning;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology Proceedings, 1998 International Conference on
  • Conference_Location
    Kyoto
  • Print_ISBN
    0-7803-4538-X
  • Type

    conf

  • DOI
    10.1109/IIT.1998.813788
  • Filename
    813788