DocumentCode
349443
Title
Angular distribution of cluster atoms due to cluster impact
Author
Muramoto, T. ; Yorizane, K. ; Yamamura, Y.
Author_Institution
Fac. of Inf., Okayama Univ., Japan
Volume
2
fYear
1999
fDate
36495
Firstpage
799
Abstract
The high-density effect on the angular distribution of penetrating cluster atoms due to cluster impacts on solid surfaces has been studied by molecular dynamics simulations. MD simulations are performed for (Cu) 201→Pt(111) and (Pt)201→Cu(111) where the cluster energies are changed from 5 eV to 50 keV per atom. It is found that the high-density formation is strongly dependent on the cluster energy and the mass ratio between a cluster atom and target atom and that the angular distributions of cluster atom are enhanced near θ=90° for 5 eV/atom Cu cluster
Keywords
copper; impurity distribution; ion implantation; ion-surface impact; metal clusters; molecular dynamics method; platinum; 5 eV to 50 keV; Cu; Cu:Pt; Pt; Pt:Cu; angular distribution; cluster impact; high-density effect; ion implantation; molecular dynamics simulations; penetrating cluster atoms; solid surfaces; Application software; Atomic measurements; Computational modeling; Computer simulation; Informatics; Ion implantation; Smoothing methods; Solid modeling; Sputtering; Surface cleaning;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1998.813788
Filename
813788
Link To Document