• DocumentCode
    3494507
  • Title

    Experimental Evidence of Mobility Enhancement in Short-Channel Ultra-thin Body Double-Gate MOSFETs

  • Author

    Chaisantikulwat, W. ; Mouis, M. ; Ghibaudo, G. ; Cristoloveanu, S. ; Widiez, J. ; Vinet, M. ; Deleonibus, S.

  • Author_Institution
    IMEP, CNRS/INPG/UJF, Grenoble
  • fYear
    2006
  • fDate
    19-21 Sept. 2006
  • Firstpage
    367
  • Lastpage
    370
  • Abstract
    We report for the first time an experimental evidence of mobility enhancement in ultra-thin body double-gate (DG) MOSFETs using magnetoresistance mobility extraction technique. Mobility in planar DC transistor operating in single and double-gate mode is measured and the temperature dependence of mobility is also studied. The results show a clear mobility improvement in double-gate mode compared to single-gate mode mobility at the same inversion charge density. This is explained by the role of volume inversion in ultra-thin body transistor operating in DG mode. Volume inversion is found to be especially beneficial in terms of mobility gain at low inversion densities
  • Keywords
    MOSFET; hole mobility; magnetoresistance; double-gate MOSFET mobility enhancement; double-gate mode mobility; inversion charge density; magnetoresistance mobility extraction technique; planar DC transistor; short-channel ultra-thin body MOSFET; single-gate mode mobility; temperature dependence; ultra-thin body transistor; Current density; Immune system; MOSFETs; Magnetic field measurement; Magnetic fields; Magnetoresistance; Scattering; Silicon; Temperature dependence; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2006. ESSDERC 2006. Proceeding of the 36th European
  • Conference_Location
    Montreux
  • ISSN
    1930-8876
  • Print_ISBN
    1-4244-0301-4
  • Type

    conf

  • DOI
    10.1109/ESSDER.2006.307714
  • Filename
    4099932