DocumentCode
349489
Title
Ion mass and energy dependence of ion-beam-induced epitaxial crystallization of SrTiO3
Author
Oyoshi, K. ; Hishita, S. ; Suehara, S. ; Komatsu, Marina ; Suzuki, Takumi ; Haneda, H.
Author_Institution
Nat. Inst. for Res. in Inorg. Mater., Ibaraki
Volume
2
fYear
1999
fDate
36495
Firstpage
994
Abstract
The amorphous SrTiO3 (110 nm thick) on single crystal SrTiO3 (100) has been crystallized by He+, Ne+ and Ar+ ion with energy of 200 keV-2 MeV at a substrate temperature of 200°C. Rutherford backscattering spectrometry and ion channeling were used to evaluate the crystallization process. Ion-beam-induced Epitaxial Crystallization (IBIEC) was confirmed and minimum backscattering yield of 10% was observed for fully crystallized sample. Roughening of the surface was observed by AFM after the IBIEC. The IBIEC kinetics from the view of both point defects generated by nuclear collision process and electronic energy deposition has been discussed. It seems that point defects dominate the IBIEC process and that the IBIEC is enhanced by electronic energy deposition in MeV region
Keywords
Rutherford backscattering; amorphous state; atomic force microscopy; channelling; crystallisation; ferroelectric materials; ion implantation; point defects; solid phase epitaxial growth; strontium compounds; surface topography; 200 C; 200 keV to 2 MeV; Rutherford backscattering spectrometry; SrTiO3; amorphous SrTiO3; atomic force microscopy; electronic energy deposition; energy dependence; ion channeling; ion mass; ion-beam-induced epitaxial crystallization; nuclear collision process; point defects; substrate temperature; surface roughening; Amorphous materials; Argon; Backscatter; Crystallization; Helium; Nuclear electronics; Rough surfaces; Spectroscopy; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1998.813846
Filename
813846
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