DocumentCode
3495047
Title
Silicon wire waveguide crossing with negligible loss and crosstalk
Author
Tsarev, Andrey
Author_Institution
Laboratory of Optical Materials and Structures Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk, Russia
fYear
2012
fDate
2-4 Oct. 2012
Firstpage
151
Lastpage
153
Abstract
Current paper introduces efficient silicon wire waveguide crossing by means of vertical coupling of tapered Si wire with upper SU-8 polymer wide strip waveguide through a silica buffer. Numerical 3D simulations by FDTD proves that optimal structure of 70 μm length provided 98% efficiency for through pass and 99.9% efficiency for cross pass as well as negligible back reflection (−50 dB) and cross talk (−70 dB). Proposed waveguide crossing on thin silicon-on-insulator CMOS compatible structures could find multiple applications in photonics.
Keywords
Silicon-on-insulator; numerical modeling; waveguide crossing;
fLanguage
English
Publisher
ieee
Conference_Titel
Actual Problems of Electronics Instrument Engineering (APEIE), 2012 11th International Conference on
Conference_Location
Novosibirsk
Print_ISBN
978-1-4673-2842-5
Type
conf
DOI
10.1109/APEIE.2012.6629163
Filename
6629163
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