Title :
Study of PH3 and B2H6 ion beam species generated by inductively coupled plasma
Author :
Chen, K. ; Ra, G.J. ; Shao, Y. ; Mo, G. ; Lichtenthal, S. ; Blake, J. ; Sato, M.
Author_Institution :
Eaton Corp., Danvers, MA, USA
Abstract :
The ion species in the PH3 and B2H6 beam extracted from an RF inductively coupled plasma are studied using a magnetic mass spectrometer, SIMS analysis, and TRIM simulation. It shows that the ion beam contains Hx+ monomer ions, (PHx+ or BHx+), and dimers (P2Hx+ or B2Hx +). The relative percentage of the ion species depends strongly on the RF power applied to the plasma. The percentage of dopant ions also depends on the gas flow rate (ion source chamber pressure) and gas concentration. The impacts of the different ion species on the implantation process are also discussed
Keywords :
boron compounds; ion implantation; ion sources; particle beam diagnostics; phosphorus compounds; plasma diagnostics; plasma materials processing; plasma simulation; secondary ion mass spectra; B2H6; B2H6 ion beam species; B2Hx+; BHx+; Hx+ monomer ions; P2Hx+; PH3; PH3 ion beam species; PHx+; RF inductively coupled plasma; SIMS analysis; TRIM simulation; dopant ions; gas concentration; gas flow rate; implantation process; inductively coupled plasma; ion source chamber pressure; ion species; magnetic mass spectrometer; Analytical models; Fluid flow; Ion beams; Magnetic analysis; Mass spectroscopy; Optical coupling; Particle beams; Plasma simulation; Plasma sources; Radio frequency;
Conference_Titel :
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-4538-X
DOI :
10.1109/IIT.1998.813906
