DocumentCode
349544
Title
Ion-implanted reservoirs and self-organized growth
Author
Brongersma, S.H. ; Castell, M.R. ; Perovic, D.D.
Author_Institution
Dept. of Phys. & Astron., Univ. of Western Ontario, London, Ont., Canada
Volume
2
fYear
1999
fDate
36495
Firstpage
1242
Abstract
Interaction between clusters through e.g. coalescence and Ostwald ripening inhibits the study of individual cluster growth. However, using an ion-implanted reservoir we have been able to create a dilute morphology of non-interacting CoSi2 clusters on a Si surface. In this scenario each cluster is connected to the implanted layer by a diffusive link, thus providing a continuous supply of cobalt. As cluster volume increases, the initially square shape is only stable up to a certain critical size, at which a shape transition occurs. A further increase of cluster volume results in a rapidly increasing length while the cluster width reduces back to α0. The resulting wire-like structures of uniform width confirm all details of the transition as predicted by Tersoff and Tromp
Keywords
cobalt; elemental semiconductors; ion implantation; silicon; CoSi2; Ostwald ripening; Si; Si:Co; clusters interaction; coalescence; individual cluster growth; ion-implanted reservoirs; selforganized growth; shape transition; wirelike structures; Astronomy; Cobalt; Crystalline materials; Lattices; Materials science and technology; Physics; Reservoirs; Shape; Surface morphology; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology Proceedings, 1998 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-7803-4538-X
Type
conf
DOI
10.1109/IIT.1998.813912
Filename
813912
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