• DocumentCode
    349544
  • Title

    Ion-implanted reservoirs and self-organized growth

  • Author

    Brongersma, S.H. ; Castell, M.R. ; Perovic, D.D.

  • Author_Institution
    Dept. of Phys. & Astron., Univ. of Western Ontario, London, Ont., Canada
  • Volume
    2
  • fYear
    1999
  • fDate
    36495
  • Firstpage
    1242
  • Abstract
    Interaction between clusters through e.g. coalescence and Ostwald ripening inhibits the study of individual cluster growth. However, using an ion-implanted reservoir we have been able to create a dilute morphology of non-interacting CoSi2 clusters on a Si surface. In this scenario each cluster is connected to the implanted layer by a diffusive link, thus providing a continuous supply of cobalt. As cluster volume increases, the initially square shape is only stable up to a certain critical size, at which a shape transition occurs. A further increase of cluster volume results in a rapidly increasing length while the cluster width reduces back to α0. The resulting wire-like structures of uniform width confirm all details of the transition as predicted by Tersoff and Tromp
  • Keywords
    cobalt; elemental semiconductors; ion implantation; silicon; CoSi2; Ostwald ripening; Si; Si:Co; clusters interaction; coalescence; individual cluster growth; ion-implanted reservoirs; selforganized growth; shape transition; wirelike structures; Astronomy; Cobalt; Crystalline materials; Lattices; Materials science and technology; Physics; Reservoirs; Shape; Surface morphology; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology Proceedings, 1998 International Conference on
  • Conference_Location
    Kyoto
  • Print_ISBN
    0-7803-4538-X
  • Type

    conf

  • DOI
    10.1109/IIT.1998.813912
  • Filename
    813912