Title :
Comparison of SF6/N2 and SF6/CO 2 gas mixtures based on the figure-of-merit concept
Author :
Qiu, Y. ; Chen, S.Y. ; Liu, Y.F. ; Kuffel, E.
Author_Institution :
High Voltage Div., Xi´´an Jiaotong Univ., China
Abstract :
The dielectric strengths of SF6/N2 and SF 6/CO2 gas mixtures, both with a mixing ratio of 50/50, were measured in a plane-parallel gap with a spherical protrusion on the high-voltage electrode surface, and in a gas-impregnated film insulation system with a mid-dielectric void. In both instances the dielectric strength of SF6/CO2 was higher than that of SF6/N2, in contrast to a uniform or quasi-uniform field gap at atmospheric pressure where SF6/N 2 is superior to SF6/CO2. The experimental results were in good agreement with calculations using the figure-of-merit values for these two gas mixtures
Keywords :
carbon compounds; electric breakdown of gases; electric strength; gaseous insulation; insulation testing; mixtures; nitrogen; sulphur compounds; CO2; N2; SF6; SF6-CO2 mixture; SF6-N2 mixture; dielectric strength; figure-of-merit values; gas mixtures; gas-impregnated film insulation system; plane-parallel gap; Breakdown voltage; Circuits; Dielectric breakdown; Electric variables measurement; Electrodes; Gas industry; Gases; Sulfur hexafluoride; Voltage measurement;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1988. Annual Report., Conference on
Conference_Location :
Ottawa, Ont.
DOI :
10.1109/CEIDP.1988.26348
