Micropartilces in silicon film using mist-jet technology for a photodetector

We have developed silicon mixed films, using a technique that combines a mist-jet ejection of crystalline silicon microparticles with PE-CVD of amorphous silicon. Using the mist-jet technology, a water mist containing silicon microparticles is ejected on the substrate. The size of coated microparticles is sub-micron. An amorphous silicon film of 500 nm was deposited after a native silicon dioxide layer of microparticles was reduced by a hydrogen plasma. As a result, the photocurrent of the mixed film has increased 93 % from that without silicon microparticles. The mixed film with N-type silicon microparticles was formed in on a P-type silicon substrate to create a photodiode. The photocurrent was linearly proportional to the illuminance in photodiode mode. We have clarified that the mixed film is appropriate for a photodetector.