DocumentCode :
3496606
Title :
A Critical Study of the Soot Deposition Rate in ACVD Process
Author :
Mishra, G.C. ; Pasare, Dattatray
Author_Institution :
Sterlite Opt. Technol. Ltd., Maharashtra
fYear :
2006
fDate :
Oct. 2006
Firstpage :
1
Lastpage :
3
Abstract :
Atmospheric Chemical Vapor Deposition (ACVD) process is widely used for silica soot deposition in the manufacture of optical fiber. In the present work a series of experiments were done on the ACVD lathe to study the deposition rate. Target core rod diameter, number of burners, distance between the burners and the distance between the target core rod and the burners were found the key parameters affecting the deposition rate. Average deposition rate of 30.2 gm/min with a material efficiency of 34% were achieved in three-burner experiment.
Keywords :
chemical vapour deposition; optical fibre fabrication; silicon compounds; ACVD process; atmospheric chemical vapor deposition; core rod; material efficiency; optical fiber manufacturing; silica soot deposition; three-burner experiment; Fires; Fuels; Gases; Hydrogen; Optical fibers; Optical materials; Optical sensors; Preforms; Silicon compounds; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communication & Optoelectronic Exposition & Conference, 2006. AOE 2006. Asian
Conference_Location :
Shanghai, China
Print_ISBN :
978-0-9789217-0-5
Type :
conf
DOI :
10.1109/AOE.2006.307334
Filename :
4100044
Link To Document :
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