DocumentCode :
3497179
Title :
Magnetically-actuated variable optical attenuators using ferrofluid-doped elastomer implemented by combination of soft lithography and inkjet printing technologies
Author :
de Pedro, Sandra ; Cadarso, Victor J. ; Munoz-Berbel, Xavier ; Plaza, J.A. ; Sort, J. ; Brugger, Juergen ; Buttgenbach, Stephanus ; Llobera, Andreu
Author_Institution :
CNM-IMB-CSIC, Esfera UAB, Bellaterra, Spain
fYear :
2013
fDate :
20-24 Jan. 2013
Firstpage :
548
Lastpage :
551
Abstract :
This paper reports the implementation of magnetic variable optical attenuators (M-VOA) by soft lithography (SLT) and using polydimethylsiloxane (PDMS) as constituent material. Two different fabrication protocols are used and compared. In the first case, a two-layer structure containing a clean PDMS layer on a magnetic PDMS (M-PDMS) layer is fabricated by SLT. M-PDMS is obtained by doping clean PDMS with different ferrofluid (FF) amounts. The second protocol consists of selectively dispensing droplets of FF by the inkjet printing technique (IPT) on a clean and non-cured PDMS structure previously defined by SLT. The optical and mechanical properties of structures fabricated using both protocols and containing similar ferrofluid amounts are compared.
Keywords :
ink jet printing; magnetic actuators; magnetic fluids; micro-optomechanical devices; optical attenuators; soft lithography; PDMS constituent material; clean PDMS layer; clean PDMS structure; doping; droplets; fabrication protocols; ferrofluid amounts; ferrofluid-doped elastomer; inkjet printing technology; magnetic PDMS layer; magnetic variable optical attenuators; magnetically-actuated variable optical attenuators; mechanical properties; noncured PDMS structure; optical properties; polydimethylsiloxane; soft lithography; two-layer structure; Magnetic fields; Optical device fabrication; Optical losses; Optical saturation; Optical sensors; Optical waveguides; Protocols;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
Conference_Location :
Taipei
ISSN :
1084-6999
Print_ISBN :
978-1-4673-5654-1
Type :
conf
DOI :
10.1109/MEMSYS.2013.6474300
Filename :
6474300
Link To Document :
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