DocumentCode :
3497302
Title :
Computer Vision Inspection for IC Wafer Based on Character of Pixels Distribution
Author :
Liming, Wu ; Fengjie, Wu ; Guitang, Wang
Author_Institution :
Fac. of Inf. Eng., Guangdong Univ. of Technol., Guangzhou
Volume :
2
fYear :
2008
fDate :
11-13 Nov. 2008
Firstpage :
248
Lastpage :
251
Abstract :
There are many vital defects in the process of fabrication of IC wafer. The redundancy material defect is an important factor of reducing the yield of IC, it mainly causes circuits to be connection failure, so it is important to recognize the redundancy material defect and ascertain the circuit´s failure style. In this paper, a simple and doable method of vision inspection for the redundancy material defect is presented. According to the image character of taken images, in order to improve image quality, the method of light compensation and morphological filter is used to eliminate the disturbed noise. Then, the projection theorem and the inspection method based on character of pixels distribution are used to recognize the connection circuits.
Keywords :
computer vision; inspection; integrated circuits; IC wafer fabrication; computer vision inspection; image character; pixels distribution; Computer vision; Etching; Hybrid integrated circuits; Inspection; Integrated circuit noise; Manufacturing processes; Optical filters; Optical noise; Pixel; Redundancy; IC wafer; Redundancy Material Defect;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Convergence and Hybrid Information Technology, 2008. ICCIT '08. Third International Conference on
Conference_Location :
Busan
Print_ISBN :
978-0-7695-3407-7
Type :
conf
DOI :
10.1109/ICCIT.2008.40
Filename :
4682248
Link To Document :
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