DocumentCode :
3497804
Title :
A simple microwave plasma-enhanced chemical vapour deposition system for the production of carbon nanotubes
Author :
Harrison, Roland D. ; Jarvis, A. L. Leigh ; Babet, S. Sergio
Author_Institution :
Sch. of Eng. (Electr., Electron. & Comput.), Univ. of KwaZulu-Natal, Durban, South Africa
fYear :
2013
fDate :
9-12 Sept. 2013
Firstpage :
1
Lastpage :
4
Abstract :
A low-cost reactor has been designed and built to confine a microwave-induced plasma for carbon nanotube growth. The system utilises a magnetron and supporting electronics from a conventional microwave oven to establish and sustain the plasma. The plasma sphere remains stable and confined to the axis of the cylindrical vessel, as per simulation. Carbon nanotube growth was identified by scanning electron microscopy in preliminary experiments performed with ethanol as the hydrocarbon source, thiophene as the promoter, and hydrogen as the support gas.
Keywords :
carbon nanotubes; microwave materials processing; nanofabrication; plasma CVD; scanning electron microscopy; C; carbon nanotubes; cylindrical vessel; ethanol; magnetron; microwave plasma-enhanced chemical vapour deposition; plasma sphere; scanning electron microscopy; stability; supporting electronics; thiophene; Carbon; Carbon nanotubes; Electromagnetic heating; Microwave ovens; Microwave theory and techniques; Plasmas; Substrates; carbon; nanotechnology; plasma confinement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
AFRICON, 2013
Conference_Location :
Pointe-Aux-Piments
ISSN :
2153-0025
Print_ISBN :
978-1-4673-5940-5
Type :
conf
DOI :
10.1109/AFRCON.2013.6757861
Filename :
6757861
Link To Document :
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