Title :
Influence of the Ge profile on VBE and current gain mismatch in Advanced SiGe BICMOS NPN HBT with 200 GHz fT
Author :
Dahlström, M. ; Walter, K. ; Von Bruns, S. ; Malladi, R.M. ; Newton, Kim M. ; Joseph, A.J.
Author_Institution :
IBM Microelectron. Div., Essex Junction, VT
Abstract :
Transistor mismatch is a key parameter for the design and operation of advanced analog circuits. The paper presents for the first time data from several generations of BiCMOS technology nodes for VBE and current gain (beta) mismatch. The authors show that the 0.12 mum BiCMOS has a 3-a VBE mismatch of 0.63 mV-mum and beta mismatch of 0.24 %-mum. CBE NPNs have essentially the same but slightly lower mismatch than CBEBC NPNs. Very small and very long devices have increased mismatch, especially at high currents. The authors also present a physical model and experimental data showing the influence of the emitter-base Ge slope on the device mismatch
Keywords :
BiCMOS analogue integrated circuits; Ge-Si alloys; heterojunction bipolar transistors; 0.12 micron; 200 GHz; BiCMOS analog circuits; SiGe; advanced BICMOS NPN HBT; advanced analog circuits; current gain mismatch; emitter-base; transistor mismatch; Analog circuits; BiCMOS integrated circuits; Circuit simulation; Germanium silicon alloys; Heterojunction bipolar transistors; Microelectronics; Photonic band gap; Silicon germanium; Voltage; Wiring; Bipolar/BiCMOS analog circuits; Ge profile; HBT; NPN; SiGe; VBE; base emitter voltage; bipolar modeling and simulation; device mismatch; mismatch;
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2006
Conference_Location :
Maastricht
Print_ISBN :
1-4244-0458-4
Electronic_ISBN :
1088-9299
DOI :
10.1109/BIPOL.2006.311146