DocumentCode
3499536
Title
Non-equilibriurn plasma-based sterilization: overview, state-of-the-art, and challenges
Author
Laroussi, M.
Author_Institution
Old Dominion University
fYear
2004
fDate
1-1 July 2004
Firstpage
107
Lastpage
107
Abstract
Summary form only given, as follows. Low temperature, high pressure, non-equilibrium plasmas are now routinely used in several material processing applications, and in some cases are competing with lowpressure plasmas in areas where these have historically been dominant. Etching and deposition are examples of such applications. In the past two decades, high-pressure plasmas have also played an enabling role in the development of excimer VUV & UV sources [I]p,la sma-based surface treating devices [2], and in environmental technology such as the cleaning of flue gases [3]. The use of these types of plasmas in emerging applications seems to go unabated. Amongst the novel applications, the use of atmospheric pressure ??cold?? plasmas in the biomedical field is experiencing a heightened interest from both the plasma science research community and the biomedical research community. This is due to newly found applications in promising medical research such as electrosurgery [4], tissue engineering [5], surface modification of bio-compatible materials [6], and the sterilization of heat-sensitive medical instruments [7]. In this talk, first a brief overview of some biomedical and environmental plasma applications will be presented. Then, an in-depth coverage of plasma-based sterilizationldecontamination research will be given. Description of several devices will be presented along with their performance as biological sterilizers. The role of each plasma-generated agent in the destruction of the cells of microorganisms will be discussed. To conclude, present challenges and future prospects of the biomedical applications of plasmas will be outlined.
Keywords
Atmospheric-pressure plasmas; Etching; Nuclear and plasma sciences; Plasma applications; Plasma devices; Plasma materials processing; Plasma sources; Plasma temperature; Surface treatment; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location
Baltimore, MD, USA
ISSN
0730-9244
Print_ISBN
0-7803-8334-6
Type
conf
DOI
10.1109/PLASMA.2004.1339597
Filename
1339597
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