DocumentCode
3499690
Title
Factors affecting energy deposition and core expansion in low current single wire experiments
Author
Duselis, P.U. ; Vaughan, J.A. ; Min Hu ; Kusse, B.R.
Author_Institution
Lab. of Plasma Studies, Cornell Univ., Ithaca, NY, USA
fYear
2004
fDate
1-1 July 2004
Firstpage
110
Abstract
Summary form only given. Single wire experiments have been performed on Cornell´s new Low Current Pulser 3 (LCP3) which consisted of a 220 nF capacitor charged to 20 kV. The capacitor and wire holder were connected in series through a switch and external, variable inductor used to control the current rise-time. This external series inductance was adjustable in five steps from 0.2 /spl mu/H to 2 /spl mu/H allowing the current rise time to be varied from 5 A/nsec to 50 A/nsec. Each wire was heated through melting and vaporizing phases by the current pulse and began expanding. Energy deposition, reproducibility and expansion rates were measured as functions of the current rise rate. These results indicate better energy deposition and higher expansion rates with faster current rise rates. The connection method and sign of the radial electric field at the surface of the wire were also varied. Preliminary experiments with copper indicate that energy deposition becomes independent of current rise rate with better wire-electrode connections.
Keywords
capacitors; copper; electrodes; inductance; inductors; melting; plasma diagnostics; vaporisation; wires; 20 kV; 220 nF; Cu; Low Current Pulser 3; capacitor; copper; electrode; energy deposition; heat treatment; inductance; inductor; low current single wire experiments; melting phase; radial electric field; switch; vaporizing phase; Capacitors; Inductance; Inductors; Laboratories; Plasmas; Radiography; Switches; Time measurement; Tungsten; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location
Baltimore, MD, USA
ISSN
0730-9244
Print_ISBN
0-7803-8334-6
Type
conf
DOI
10.1109/PLASMA.2004.1339602
Filename
1339602
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