DocumentCode :
3500
Title :
SOI Field-Effect Diode DRAM Cell: Design and Operation
Author :
Badwan, Ahmad Z. ; Chbili, Zakariae ; Yang Yang ; Salman, Adnan Ahmed ; Qiliang Li ; Ioannou, Dimitris E.
Author_Institution :
Electr. & Comput. Eng. Dept., George Mason Univ., Fairfax, VA, USA
Volume :
34
Issue :
8
fYear :
2013
fDate :
Aug. 2013
Firstpage :
1002
Lastpage :
1004
Abstract :
A dynamic RAM cell based on the field-effect diode (FED) is presented, and its operation is described and explained with the help of numerical device simulations. This new cell resembles the thin capacitively coupled thyristor (TCCT) cell in concept and operation, however it has important advantages. These advantages derive from the fact that the thyristor-like mode of operation of the FED is gate induced, whereas the TCCT is an actual, built-in thyristor. High read 0/1 current margin, fast write/read time, good retention, and densely packed cells are obtained.
Keywords :
DRAM chips; silicon-on-insulator; thyristors; DRAM cell; SOI FED; SOI field-effect diode; Si; TCCT cell; built-in thyristor; dynamic RAM cell; numerical device simulations; thin capacitively coupled thyristor cell; thyristor-like mode; Dynamic RAM (DRAM); FBC; field-effect diode (FED); silicon-on-insulator (SOI);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2265552
Filename :
6544600
Link To Document :
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