DocumentCode
3500236
Title
In situ particle monitoring in a single wafer poly silicon and silicon nitride etch system
Author
Busselman, B. ; Emery, T. ; Staker, K. ; Heiman, K. ; Tran, D. ; Elzingre, M. ; Markle, R.
Author_Institution
Texas Instrum., SEMATECH, Dallas, TX, USA
fYear
1993
fDate
1993
Firstpage
20
Lastpage
26
Abstract
An in situ particle monitor has been installed in a single wafer polysilicon and silicon nitride etch system. Particle data collected during etching and wafer transport operations has been correlated to functional yield, short loop monitors and patterned wafer visual inspections. Based on these correlations, significant cost reductions are predicted.
Keywords
etching; particle counting; semiconductor technology; cost reductions; etch system; functional yield; in situ particle monitor; nitride etching; patterned wafer visual inspections; polysilicon etching; short loop monitors; single wafer; wafer transport operations; Costs; Etching; Inspection; Instruments; Manufacturing processes; Monitoring; Particle production; Plasma applications; Semiconductor device manufacture; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Science Symposium, 1993. ISMSS 1993., IEEE/SEMI International
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-1212-0
Type
conf
DOI
10.1109/ISMSS.1993.263705
Filename
263705
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