Title :
In situ particle monitoring in a single wafer poly silicon and silicon nitride etch system
Author :
Busselman, B. ; Emery, T. ; Staker, K. ; Heiman, K. ; Tran, D. ; Elzingre, M. ; Markle, R.
Author_Institution :
Texas Instrum., SEMATECH, Dallas, TX, USA
Abstract :
An in situ particle monitor has been installed in a single wafer polysilicon and silicon nitride etch system. Particle data collected during etching and wafer transport operations has been correlated to functional yield, short loop monitors and patterned wafer visual inspections. Based on these correlations, significant cost reductions are predicted.
Keywords :
etching; particle counting; semiconductor technology; cost reductions; etch system; functional yield; in situ particle monitor; nitride etching; patterned wafer visual inspections; polysilicon etching; short loop monitors; single wafer; wafer transport operations; Costs; Etching; Inspection; Instruments; Manufacturing processes; Monitoring; Particle production; Plasma applications; Semiconductor device manufacture; Silicon;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1993. ISMSS 1993., IEEE/SEMI International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-1212-0
DOI :
10.1109/ISMSS.1993.263705
