• DocumentCode
    3500694
  • Title

    Experience of design and application of plasma electron gun for bad vacuum conditions

  • Author

    Burdovitsin, V. ; Burachevsky, Y. ; Oks, E. ; Fedorov, M.

  • Author_Institution
    Tomsk State Univ. Control Syst. & Radio Electron., Russia
  • fYear
    2004
  • fDate
    1-1 July 2004
  • Firstpage
    137
  • Abstract
    Summary form only given. Present work contents results about ribbon beam gun construction and its application for plasma sheet production and thin films deposition if hydrocarbon gas is used as working gas. 3 mm diameter collector movable in two coordinates perpendicularly beam direction show beam density distribution. Plasma density near beam axis was about 10/sup 10/-10/sup 11/ cm/sup -3/. Such plasma parameters allow to use it for thin film deposition. Glass substrates were disposed at different distances X from beam and plasma axis. Experiments with inert gas (argon) show that the most probable etching process is ion sputtering. Film growth takes place due to hydrocarbon radicals diffusion toward substrate. As ions and radicals production takes place because of electron beam interaction with gas molecules we are able to calculate ions and radicals distributions.
  • Keywords
    argon; electron guns; plasma density; plasma deposition; plasma guns; sputter deposition; sputter etching; 3 mm; Ar; beam density distribution; electron beam interaction; etching process; film growth; gas molecules; glass substrates; hydrocarbon gas; hydrocarbon radicals diffusion; inert gas; ion production; ion sputtering; plasma axis; plasma density; plasma electron gun; plasma parameters; plasma sheet production; radicals distributions; radicals production; ribbon beam gun construction; thin films deposition; vacuum conditions; Electrons; Glass; Hydrocarbons; Particle beams; Plasma applications; Plasma density; Production; Sputtering; Structural beams; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
  • Conference_Location
    Baltimore, MD, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-8334-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.2004.1339659
  • Filename
    1339659