Research of capillary Z pinch extreme-ultraviolet light source

Summary form only given. An extreme-ultraviolet (EUV) radiation source near the wavelength of 13.5 nm which utilizes a xenon-filled capillary Z-pinch plasma is presented. The xenon plasma exhibits broadband emission characteristics that offer radiation near 11 nm and 13.5 nm. A fast-several kA current derived from pulse compression circuit consisting of magnetic switch, a high voltage transformer and a static induction (SI) thyristor stack is applied across the capillary to produce the radiation. The EUV radiation and dynamics of pinching plasma in a capillary are characterized by employing a photodiode measurement and a high-speed camera in the visible region. A grazing incidence spectrograph is also used to investigate spectral emission from the plasma and the scaling of this EUV light source for lithography.