DocumentCode
3501210
Title
Deep wet etching process of Pyrex glass for vacuum packaging
Author
Shuai Shi ; Xuefang Wang ; Minghai Xu ; Yuzhe Wang ; Jiaojiao Yuan ; Sheng Liu
Author_Institution
Sch. of Mech. Sci. & Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
fYear
2012
fDate
13-16 Aug. 2012
Firstpage
44
Lastpage
48
Abstract
In this paper, experiments were carried out to confirm that Copper layer was a feasible masking material during the wet etching process of Pyrex glass for vacuum packaging or 3D packaging. Our study revealed that the sputtered Chromium and Copper layers combination with the electroplated Copper layer is an ideal etching mask. The improvement of the corrosion solution produced some more reliable results. The maximum etching depth in the glass can be as high as 200μm along without pinholes and notch defects on the surface. It may have a long-term impact on MEMS development and applications.
Keywords
copper; corrosion; electronics packaging; electroplating; etching; glass; masks; 3D packaging; MEMS development; Pyrex glass; corrosion solution; deep wet etching process; electroplated copper layer; ideal etching mask; masking material; sputtered chromium layer; vacuum packaging; Bonding; Copper; Glass; Packaging; Wet etching; Anodic bonding; Pyrex7740 glass; Vacuum packaging; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2012 13th International Conference on
Conference_Location
Guilin
Print_ISBN
978-1-4673-1682-8
Electronic_ISBN
978-1-4673-1680-4
Type
conf
DOI
10.1109/ICEPT-HDP.2012.6474565
Filename
6474565
Link To Document