• DocumentCode
    3501562
  • Title

    Simulation-based investigation in effects of design parameters on electrical characters for a TSV-bump combination

  • Author

    Runiu Fang ; Xin Sun ; Min Miao ; Yufeng Jin

  • Author_Institution
    Nat. Key Lab. of Sci. & Technol. on Micro/Nano Fabrication, Peking Univ., Beijing, China
  • fYear
    2012
  • fDate
    13-16 Aug. 2012
  • Firstpage
    121
  • Lastpage
    126
  • Abstract
    The silicon industry has witnessed a half-century gallop of electronics. When technologies reached their limits, new technologies are budding out and prolong the unbreakable Moore´s Law. This time, Through Silicon Via (TSV) is considered the most promising technology trend in the next decade. In this paper, we study the electrical characters of a TSV-bump combination under the ground-signal-ground configuration. Effects of design parameters, including geometries and material parameters, on systematic electrical characteristics are investigated and concluded in terms of scatter (S) parameters by a 3D electromagnetic solver. To verify the simulated electrical performance, this paper proposes the equivalent electrical model of the GSG configuration consisting of RLCG parasitic elements. Analytical models are assigned to each parasitic component by employing classical equivalent circuit models of different types of transmission lines. Good agreement is achieved on S-parameters between the 3D electromagnetic solver and the proposed lumped circuit model in the frequency range of 0.1-20GHz.
  • Keywords
    equivalent circuits; three-dimensional integrated circuits; 3D electromagnetic solver; Moore´s law; RLCG parasitic elements; TSV-bump combination; design parameters; electrical characters; equivalent circuit models; frequency 0.1 GHz to 20 GHz; ground-signal-ground configuration; lumped circuit model; scatter parameters; silicon industry; simulation-based investigation; through silicon via; transmission lines; Conductivity; Insulation; Integrated circuit modeling; Silicon; Substrates; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2012 13th International Conference on
  • Conference_Location
    Guilin
  • Print_ISBN
    978-1-4673-1682-8
  • Electronic_ISBN
    978-1-4673-1680-4
  • Type

    conf

  • DOI
    10.1109/ICEPT-HDP.2012.6474583
  • Filename
    6474583