Title :
H/sub /spl alpha// emission as a plasma vapor deposition control sensor for tribological, diamond-like carbon coatings
Author :
Klepper, C.C. ; Carlson, E.P. ; Hazelton, R.C. ; Yadlowsky, E.J. ; Taher, M.A. ; Feng, B.
Abstract :
Summary form only given. To improve the reproducibility of metal-containing, hydrogenated diamond-like carbon (Me-DLC:H) coatings deposited by physical vapor deposition (PVD) techniques such as reactive sputtering, various plasma probes have been studied as potential in-situ sensors integrated with a closed-loop deposition control system. In a series of Design-of-Experiment (DoE) test runs on an unbalanced magnetron sputtering setup, the plasma probes were tested for their sensitivity to process input factors and as candidates for a feedback control system. These include optical emission and absorption spectroscopy of metal atoms, conventional and electron emissive Langmuir probes, and hydrogen atomic line emission at 656.3 nm (H/sub /spl square//). An important result of these studies was that Ha is potentially an ideal control sensor, because of the apparent high sensitivity of the total emission to changes in the film deposition chemistry that tend to occur naturally during the course of deposition of the functional coatings. A more detailed analysis of the spectral profile of H/sub /spl alpha// for the various regimes of the deposition have shown that the emission is dominated by a "hot" component (/spl sim/20 eV), which can be attributed to dissociative excitation of molecular hydrogen. Since electron collisional dissociation of hydrocarbons in the plasma can only produce atomic hydrogen (the observed "cold" component), it is inferred that the Ha is a measure of hydrogen generation in the film, thus confirming the concept that it can be used as a deposition chemistry probe. As such, it can take the form of a compact photo-detector with an H/sub /spl alpha// interference filter, providing economy, as well as fast time response. Another benefit of H/sub /spl alpha// emission that it can be used as a sensor for any type of DLC:H, including nano-structured (carbide-containing) Me:DLC:H coatings, produced for tribological applications.
Keywords :
Langmuir probes; closed loop systems; diamond-like carbon; luminescence; nanostructured materials; plasma deposition; sputter deposition; tribology; 656.3 nm; C:H; H alpha-emission; PVD; absorption spectra; closed-loop deposition control system; control sensor; diamond-like carbon coatings; dissociative excitation; electron collisional dissociation; electron emissive Langmuir probe; feedback control system; film deposition chemistry; hydrocarbon; hydrogen atomic line emission; hydrogen generation; in-situ sensors; interference filter; magnetron sputtering; metal atoms; molecular hydrogen; nanostructured material; optical emission spectra; physical vapor deposition; plasma probes; plasma vapor deposition; reactive sputtering; sensitivity; tribology; Atom optics; Atomic layer deposition; Chemical sensors; Coatings; Hydrogen; Plasma chemistry; Plasma measurements; Probes; Sputtering; System testing;
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-8334-6
DOI :
10.1109/PLASMA.2004.1339721