Processing with LAPPS

Summary form only given. Non-equilibrium (T/sub e//spl Gt/T/sub ion,gas/) plasma processing often allows for greater process control with reduced environmental impact when compared to other materials processing methods, and therefore presents tremendous opportunities in the areas of thin film development and surface modification. NRL´s ´Large Area Plasma Processing System´ (LAPPS) has been developed based on the high-energy electron beam ionization process, with the goal of maximizing the benefits of plasma processing over large areas (/spl sim/1 m/sup 2/). In this work we presented deposition applications and surface treatments using these e-beam produced plasmas alone or combined with other plasma sources. The deposition of TiN and SiO/sub 2/ thin films on silicon have been investigated in Ar/N/sub 2/ and O/sub 2//TEOS gas mixtures, respectively. Relevant ex situ material characterization (X-ray diffraction, atomic force microscopy, electrical analysis, and optical microscopy) will be presented to correlate materials properties to process characteristics. Similarly, the results of surface treatments using these plasma systems will also be presented. The treatments to be discussed are the nitriding stainless steel for increased hardness and the changing the surface properties of fiber-based materials. Results from both of these treatments have shown dramatic surface enhancements that are competitive with present commercial and laboratory-based techniques.