DocumentCode :
3503302
Title :
Near Field-Emission SEM: Primary electron beam generation and comparison with STM
Author :
Zanin, Danilo A. ; Cabrera, H. ; De Pietro, L.G. ; Thalmann, M. ; Pescia, D. ; Ramsperger, U.
Author_Institution :
Lab. for Solid State Phys., ETH Zurich, Zürich, Switzerland
fYear :
2012
fDate :
9-13 July 2012
Firstpage :
1
Lastpage :
2
Abstract :
In Near Field-Emission Scanning Electron Microscopy the source of the primary beam is only few tens nm away from the target. We report the progress in primary beam generation and compare the performance of the instrument in field emission mode with respect to the well-established Scanning Tunneling Microscopy (STM).
Keywords :
field emission electron microscopy; scanning electron microscopy; field emission mode; near field-emission scanning electron microscopy; primary beam generation; primary beam source; Apertures; Contamination; Electron beams; Scanning electron microscopy; Field-Emission; NFESEM; STM;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
ISSN :
pending
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
Type :
conf
DOI :
10.1109/IVNC.2012.6316839
Filename :
6316839
Link To Document :
بازگشت