Title :
A novel fabrication of Spindt-type field emitters with focusing electrodes
Author :
Nagao, Masayoshi ; Yoshida, Tomoya ; Nishi, Takashi ; Koda, Nobuko
Author_Institution :
Nanoelectron. Res. Inst., Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
Abstract :
A new fabrication method of Spindt-type emitters will be presented. In our method, a double-layered photoresist is used as a parting layer, and high power impulse magnetron sputtering (HiPIMS) is used instead of e-beam evaporator for emitter cone formation. The etch-back method, which we have already developed, is adopted to form the multi-gate focusing electrodes on each emitter cone. Our process will make it possible to use a large substrate for Spindt emitter formation.
Keywords :
electrodes; field emitter arrays; photoresists; sputter etching; HiPIMS; Spindt emitter formation; Spindt-type field emitter fabrication method; double-layered photoresist; e-beam evaporator; emitter cone formation; etch-back method; field emitter array; high power impulse magnetron sputtering; multigate focusing electrodes; parting layer; Cavity resonators; Electrodes; Fabrication; Logic gates; Resists; Sputtering; Substrates; HiPIMS; Lift off; Spindt-type emitter; etch-back;
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
DOI :
10.1109/IVNC.2012.6316874
