DocumentCode :
3504614
Title :
Structure change and field emission of carbon nanotubes treated by plasma
Author :
Yu, SeGi ; Kim, Jin-Young ; So-Yeon
Author_Institution :
Dept. of Phys., Hankuk Univ. of Foreign Studies, Yongin, South Korea
fYear :
2012
fDate :
9-13 July 2012
Firstpage :
1
Lastpage :
2
Abstract :
We study the field emission properties of multiwalled carbon nanotubes (MWCNTs) grown by thermal chemical vapor deposition (TCVD) on silicon substrate before and after plasma treatment. Ar and O2 gas plasma were used, which was compared with non-treated MWCNTs. The O2 plasma treated MWCNTs exhibited the most excellent electron emission among two plasmas treatment. In addition, uniformity of electron emission for O2 plasma treatment was good and turn-on field was decreased. Thus, plasma treated CNT was considered as using field emitter.
Keywords :
carbon nanotubes; electron field emission; plasma CVD; C; MWCNT; Si; TCVD; electron field emission property; field emitter; gas plasma; multiwalled carbon nanotubes; plasma treated CNT; plasma treatment; thermal chemical vapor deposition; turn-on field; carbon nanotube; field emission; plasma;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location :
Jeju
ISSN :
pending
Print_ISBN :
978-1-4673-1983-6
Electronic_ISBN :
pending
Type :
conf
DOI :
10.1109/IVNC.2012.6316898
Filename :
6316898
Link To Document :
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