DocumentCode
3505724
Title
High tip density gated field emitter arrays: Different miniaturization approaches
Author
Mustonen, Anna ; Kirk, Eugenie ; Guzenko, Vitaliy ; Spreu, Christian ; Soichiro, Tsujino ; Feurer, Thomas
Author_Institution
Lab. for Micro- & Nanotechnol., Paul Scherrer Inst., Villigen, Switzerland
fYear
2012
fDate
9-13 July 2012
Firstpage
1
Lastpage
2
Abstract
The authors present miniaturization approaches for field emitter arrays fabricated by molding technique. Gated all-metal field emitter arrays with submicron pitch and 200 nm emitter base size are successfully demonstrated.
Keywords
field emitter arrays; field emitter array miniaturization approach; gated all-metal field emitter arrays; high tip density gated field emitter arrays; size 200 nm; Electron beams; Fabrication; Field emitter arrays; Lithography; Logic gates; Metals; Substrates; electron beam lithography; gated field emitter arrays; molding; nanoimprint planarization; submicron pitch;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
Conference_Location
Jeju
ISSN
pending
Print_ISBN
978-1-4673-1983-6
Electronic_ISBN
pending
Type
conf
DOI
10.1109/IVNC.2012.6316954
Filename
6316954
Link To Document