DocumentCode
350623
Title
Nano-lithography using micropipette
Author
Mun-Heon Hong ; Ki-Hyun Kim ; Joon-Ho Bae ; Wonho Jhe
Author_Institution
Dept. of Phys., Seoul Nat. Univ., South Korea
Volume
3
fYear
1999
fDate
Aug. 30 1999-Sept. 3 1999
Firstpage
977
Abstract
We are developing a novel lithography system for nanometric scale pattern fabrication using near-field technology. We have built our own scanning shear force microscope for this purpose, where a micropipette is used as a probe. Using shear force distance regulation, the pipette probe follows the sample surface topography and on the desired point, photoresist is ejected on to the sample surface by applying pressure on the other side of pipette using an inchworm. Various patterns can be fabricated by scanning the sample and by control of photoresist ejection.
Keywords
lithography; nanotechnology; micropipette; nanolithography; near-field technology; scanning shear force microscope; shear force distance regulation; Apertures; Fabrication; Instruments; Lithography; Motion control; Nanopositioning; Physics; Probes; Scanning electron microscopy; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location
Seoul, South Korea
Print_ISBN
0-7803-5661-6
Type
conf
DOI
10.1109/CLEOPR.1999.817929
Filename
817929
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