DocumentCode :
350623
Title :
Nano-lithography using micropipette
Author :
Mun-Heon Hong ; Ki-Hyun Kim ; Joon-Ho Bae ; Wonho Jhe
Author_Institution :
Dept. of Phys., Seoul Nat. Univ., South Korea
Volume :
3
fYear :
1999
fDate :
Aug. 30 1999-Sept. 3 1999
Firstpage :
977
Abstract :
We are developing a novel lithography system for nanometric scale pattern fabrication using near-field technology. We have built our own scanning shear force microscope for this purpose, where a micropipette is used as a probe. Using shear force distance regulation, the pipette probe follows the sample surface topography and on the desired point, photoresist is ejected on to the sample surface by applying pressure on the other side of pipette using an inchworm. Various patterns can be fabricated by scanning the sample and by control of photoresist ejection.
Keywords :
lithography; nanotechnology; micropipette; nanolithography; near-field technology; scanning shear force microscope; shear force distance regulation; Apertures; Fabrication; Instruments; Lithography; Motion control; Nanopositioning; Physics; Probes; Scanning electron microscopy; Surface topography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location :
Seoul, South Korea
Print_ISBN :
0-7803-5661-6
Type :
conf
DOI :
10.1109/CLEOPR.1999.817929
Filename :
817929
Link To Document :
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