DocumentCode :
3506351
Title :
Absorption edge in silica glass
Author :
Boscaino, R. ; Vella, E. ; Navarra, G.
Author_Institution :
Dept. of Phys. & Astron. Sci., Palermo Univ., Italy
fYear :
2005
fDate :
22-24 June 2005
Firstpage :
318
Lastpage :
322
Abstract :
Measurements of optical absorption in the v-UV range in a variety of silica glass are used to determine the width of the absorption edge (Urbach energy). Measured values range from 60 meV up to 180 meV. So high a variability over silica types is tentatively ascribed to the different disorder degree, which characterizes different materials.
Keywords :
optical glass; silicon compounds; ultraviolet spectra; 60 to 180 meV; SiO2; Urbach energy; absorption edge; silica glass; v-UV range; Absorption; Amorphous materials; Crystalline materials; Energy measurement; Extraterrestrial measurements; Glass; Optical materials; Optical sensors; Silicon compounds; Tail;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Fibres and Optical Passive Components, 2005. Proceedings of 2005 IEEE/LEOS Workshop on
Print_ISBN :
0-7803-8949-2
Type :
conf
DOI :
10.1109/WFOPC.2005.1462147
Filename :
1462147
Link To Document :
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