A comparative study of fluorinated amorphous carbon films synthesized by pulsed vacuum arc plasma deposition and by PECVD

Author

Yao, Z.Q. ; Yang, P. ; Huang, N. ; Sun, H. ; Wang, J.

Author_Institution

Lab. of Adv. Mater. Process., Southwest Jiaotong Univ., Chengdu, China

fYear

2004

fDate

1-1 July 2004

Firstpage

301

Abstract

Summary form only given. Fluorinated amorphous carbon films have received a considerable amount of attention recently due to their chemical inertness, water-proofing, low surface energy, anti-adherence of bacteria and biocompatibility. To explore the application in biomedical devices like electrosurgical tools, fluorinated amorphous carbon films with different fluorine content were fabricated on a silicon wafer by pulsed vacuum arc plasma deposition and by PECVD. Film composition and structure were characterized by X-ray photoelectron spectroscopy (XPS) and Raman scattering spectroscopy (Raman). Surface morphology and roughness were analyzed by atomic force microscopy (AFM). Hardness and scratch resistance were measured by nano-indentation and nano-scratching, respectively. Water contact angles were measured by the sessile drop method.

Keywords

Raman spectra; X-ray photoelectron spectra; amorphous state; atomic force microscopy; biomedical materials; carbon; contact angle; fluorine; hardness; indentation; micromechanics; plasma CVD; plasma CVD coatings; stoichiometry; surface morphology; surface roughness; AFM; C:F; PECVD; Raman scattering spectroscopy; X-ray photoelectron spectroscopy; XPS; atomic force microscopy; bacteria antiadherence; biocompatibility; biomedical devices; chemical inertness; contact angle; electrosurgical tools; film composition; film structure; fluorinated amorphous carbon films; fluorine content; hardness; nanoindentation; nanoscratch; pulsed vacuum arc plasma deposition; scratch resistance; sessile drop method; silicon wafer; surface energy; surface morphology; surface roughness; Amorphous materials; Atomic force microscopy; Plasma applications; Plasma chemistry; Plasma devices; Plasma measurements; Raman scattering; Spectroscopy; Surface morphology; Vacuum arcs;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on

Conference_Location

Baltimore, MD, USA

ISSN

0730-9244

Print_ISBN

0-7803-8334-6

Type

conf

DOI

10.1109/PLASMA.2004.1339977

Filename

1339977