DocumentCode
3508182
Title
Two dimensional PIC-MCC calculation of a CCRF discharge in methane: transition between different modes
Author
Schweigert, I.V. ; Alexandrov, A.L.
Author_Institution
Inst. of Theor. & Appl. Mech., Novosibirsk, Russia
fYear
2004
fDate
1-1 July 2004
Firstpage
333
Abstract
Summary form only given. Two dimensional capacitively coupled ratio frequency discharge in methane is simulated by fast PIC-MCC method. The results were obtained in pressure range 50-300 mTorr and voltage range 40-180 V for discharge frequency 13.56 MHz. The electron energy and electron-methane reaction rates spatial distributions show existence of two regimes of discharge glow: a) with active sheaths, when electrons are cold in the middle of discharge and the reactions proceed in electrode sheaths regions; b) with volume domination, when the electron energy is more uniform and the reactions take place in all discharge volume. The transition between these two modes is studied with variation of discharge voltage. The second regime is usually observed for low discharge voltages, and turns to the first one with voltage increasing. Besides, simulation of chemical reactions in methane plasma was also fulfilled to find the gas mixture composition in discharge volume. The results are in agreement with the known experimental data.
Keywords
gas mixtures; glow discharges; organic compounds; plasma chemistry; plasma instability; plasma sheaths; plasma simulation; 13.56 MHz; 40 to 180 V; 50 to 300 mtorr; CCRF discharge; active sheath; chemical reactions simulation; discharge glow; electrode sheath; electron energy; electron-methane reaction rate; frequency discharge; gas mixture composition; methane plasma; spatial distribution; two dimensional PIC-MCC calculation; Atomic beams; Electrons; Frequency; Nuclear and plasma sciences; Plasma chemistry; Plasma density; Plasma diagnostics; Plasma simulation; Plasma temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location
Baltimore, MD, USA
ISSN
0730-9244
Print_ISBN
0-7803-8334-6
Type
conf
DOI
10.1109/PLASMA.2004.1340039
Filename
1340039
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