Title :
The microstructure and properties of titanium oxide deposited at different substrate temperature and bias voltage by pulse vacuum arc plasma deposition
Author :
Leng, Y.X. ; Yang, P. ; Chen, J.Y. ; Wan, G.J. ; Sun, H. ; Huang, N.
Author_Institution :
Sch. of Mater. Sci. & Eng., Southwest Jiaotong Univ., Chengdu, China
Abstract :
Summary form only given. The objective of the present studies was to characterize the titanium oxide films synthesized by metal vacuum arc deposition at different substrate temperature and bias voltage as well as to test microstructure and properties. The deposition conditions were: metal arc pulse frequency=60 Hz, metal arc pulse duty=1 ms, substrate voltage=-50 V/spl sim/-200 V, substrate temperature=50/spl sim/800/spl deg/C. The film composition was determined by XPS and RBS. The surface morphology was studied by AFM and the microstructure was studied by XRD and Raman. The blood compatibility was evaluated in vitro by platelet adhesion measurement. The microstructure and properties (mechanical, physical properties and blood compatibility) of titanium oxide which deposited at different substrate bias voltage were discussed. The results showed that physical properties such as surface energy and semiconductivity are found to play important roles on blood compatibility.
Keywords :
Raman spectra; Rutherford backscattering; X-ray diffraction; X-ray photoelectron spectra; adhesion; atomic force microscopy; biomechanics; biomedical materials; blood; crystal microstructure; hardness; prosthetics; surface energy; surface morphology; thin films; titanium compounds; vacuum deposition; wear resistance; -50 to -200 V; 1 ms; 50 to 800 degC; 60 Hz; AFM; RBS; Raman spectra; Rutherford backscattering; TiO; X-ray diffraction; X-ray photoelectron spectra; XPS; XRD; atomic force microscopy; bias voltage; blood compatibility; bones; film composition; mechanical properties; metal vacuum arc deposition; metallic biomaterials; microstructure; physical properties; platelet adhesion; pulse vacuum arc plasma deposition; rutile structure oxide layer thickness; semiconductivity; substrate temperature; surface energy; surface hardness; surface morphology; tissues; titanium oxide deposition; titanium oxide film; titanium-based materials; wear resistance; Blood; Mechanical factors; Microstructure; Plasma properties; Plasma temperature; Substrates; Surface morphology; Titanium; Vacuum arcs; Voltage;
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-8334-6
DOI :
10.1109/PLASMA.2004.1340085
