DocumentCode
3510281
Title
Mesa structure formation using potassium hydroxide and ethylene diamine based etchants
Author
Chang, S.-C. ; Hicks, D.B.
Author_Institution
General Motors Res. Lab., Warren, MI, USA
fYear
1988
fDate
6-9 June 1988
Firstpage
102
Lastpage
103
Abstract
A comparative study was done between ethylene diamine-pyrocatechol (EDP) and potassium hydroxide (KOH) etching systems for micromachining mesas in
Keywords
elemental semiconductors; etching; organic compounds; potassium compounds; semiconductor technology; silicon; KOH; Si; etchants; ethylene diamine-pyrocatechol; micromachining; relative etch rates; Etching; Laboratories; Micromachining; Micromotors; Semiconductor device modeling; Silicon compounds; Temperature; Water;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE
Conference_Location
Hilton Head Island, SC, USA
Type
conf
DOI
10.1109/SOLSEN.1988.26446
Filename
26446
Link To Document