DocumentCode
3510464
Title
The diagnosis of electron temperature in dielectric barrier discharge at atmospheric pressure
Author
Junxia Ran ; Lifang Dong ; Zhiguo Mao ; Zengqian Yin
Author_Institution
Coll. of Phys. Sci. & Technol., Hebei Univ., Baoding, China
fYear
2004
fDate
1-1 July 2004
Firstpage
394
Abstract
Summary form only given. Glow dielectric barrier discharge and dynamics of pattern appears as an attractive solution to realize an atmospheric pressure cold plasma process suitable for all the surface treatments including thin film coating and material making. Such development requires a large understanding of the DBD physics and chemistry. The objective of this work is to contribute to that understanding. We report results of the measurement of the spectrum from 690 nm to 800 nm of Ar DBD under atmosphere pressure. It is shown that the spectra are diverse depending on experimental conditions. The electron temperature T/sub e/ has been measured using intensity ratio (763.72 nm, 2P/sub 6//spl rarr/1S/sub 5/; 772.63 nm, 2P/sub 2//spl rarr/1S/sub 3/) by optical emission spectroscopy under different experimental conditions. It is shown that the temperature in flow-gas is lower than in stationary gas under the same conditions. Which is about 0.1 eV/spl sim/0.3 eV in flow-gas while 0.3 eV/spl sim/0.5 eV in stationary gas. But the spectrum line intensity ratio of 763.72 nm (2P/sub 6//spl rarr/1S/sub 5/, 13.172 eV) and 696.73 nm (2P/sub 2//spl rarr/1S/sub 5/, 13.328 eV) is less than 1 in flow gas while which is bigger than 1 in stationary gas at the same energy input. The results are likely to be explained by Penning ionization.
Keywords
argon; glow discharges; plasma chemistry; plasma diagnostics; plasma flow; plasma temperature; 690 to 800 nm; Ar; Penning ionization; atmospheric pressure; cold plasma process; electron temperature; gas flow; glow dielectric barrier discharge; optical emission spectroscopy; spectrum line intensity; surface treatment; thin film coating; Atmospheric measurements; Atmospheric-pressure plasmas; Dielectric thin films; Electrons; Plasma chemistry; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma temperature; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location
Baltimore, MD, USA
ISSN
0730-9244
Print_ISBN
0-7803-8334-6
Type
conf
DOI
10.1109/PLASMA.2004.1340159
Filename
1340159
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