• DocumentCode
    3510464
  • Title

    The diagnosis of electron temperature in dielectric barrier discharge at atmospheric pressure

  • Author

    Junxia Ran ; Lifang Dong ; Zhiguo Mao ; Zengqian Yin

  • Author_Institution
    Coll. of Phys. Sci. & Technol., Hebei Univ., Baoding, China
  • fYear
    2004
  • fDate
    1-1 July 2004
  • Firstpage
    394
  • Abstract
    Summary form only given. Glow dielectric barrier discharge and dynamics of pattern appears as an attractive solution to realize an atmospheric pressure cold plasma process suitable for all the surface treatments including thin film coating and material making. Such development requires a large understanding of the DBD physics and chemistry. The objective of this work is to contribute to that understanding. We report results of the measurement of the spectrum from 690 nm to 800 nm of Ar DBD under atmosphere pressure. It is shown that the spectra are diverse depending on experimental conditions. The electron temperature T/sub e/ has been measured using intensity ratio (763.72 nm, 2P/sub 6//spl rarr/1S/sub 5/; 772.63 nm, 2P/sub 2//spl rarr/1S/sub 3/) by optical emission spectroscopy under different experimental conditions. It is shown that the temperature in flow-gas is lower than in stationary gas under the same conditions. Which is about 0.1 eV/spl sim/0.3 eV in flow-gas while 0.3 eV/spl sim/0.5 eV in stationary gas. But the spectrum line intensity ratio of 763.72 nm (2P/sub 6//spl rarr/1S/sub 5/, 13.172 eV) and 696.73 nm (2P/sub 2//spl rarr/1S/sub 5/, 13.328 eV) is less than 1 in flow gas while which is bigger than 1 in stationary gas at the same energy input. The results are likely to be explained by Penning ionization.
  • Keywords
    argon; glow discharges; plasma chemistry; plasma diagnostics; plasma flow; plasma temperature; 690 to 800 nm; Ar; Penning ionization; atmospheric pressure; cold plasma process; electron temperature; gas flow; glow dielectric barrier discharge; optical emission spectroscopy; spectrum line intensity; surface treatment; thin film coating; Atmospheric measurements; Atmospheric-pressure plasmas; Dielectric thin films; Electrons; Plasma chemistry; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma temperature; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
  • Conference_Location
    Baltimore, MD, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-8334-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.2004.1340159
  • Filename
    1340159