DocumentCode
3510587
Title
Experimental investigation of a low-pressure N/sub 2/-O/sub 2/ microwave discharge
Author
Henriques, J. ; Ricard, A.
Author_Institution
CPAT, Univ. Paul Sabatier, Toulouse, France
fYear
2004
fDate
1-1 July 2004
Firstpage
397
Abstract
Summary form only given. Microwave N/sub 2/-O/sub 2/ discharges driven by traveling surface waves attract attention as sources of active species, in particular for cold plasma sterilization of surgical material and other medical devices. The objective of this study is to investigate the concentration of various active species, such as O and N atoms, N/sub 2//sup +/ ions, and N/sub 2/(A/sup 3//spl Sigma//sub u//sup +/) and NO(A/sup 2//spl Sigma//sub u//sup +/) molecules, as a function of the spatial position and the mixture composition in an azimuthally symmetric surface wave driven discharge operating at /spl omega//2/spl pi/=2.45 GHz. The plasma column is created in N/sub 2/-xO/sub 2/ mixtures (x/spl les/25%) at the pressure p=5 Torr, in a quartz glass tube with inner radius a=0.25 cm, with flow rates in the range Q=300-1000 sccm and microwave power between 100 and 150 watts. Emission spectroscopy is used to measure the N/sub 2/(1/sup +/,2/sup +/,1/sup -/) and NO(/spl gamma/, /spl beta/) band intensities in the discharge and in early post-discharge.
Keywords
biomedical materials; gas mixtures; high-frequency discharges; nitrogen; oxygen; plasma flow; plasma materials processing; plasma pressure; plasma waves; 0.25 cm; 100 to 150 W; 2.45 GHz; 5 torr; N/sub 2/; N/sub 2/(A/sup 3//spl Sigma//sub u//sup +/) molecules; N/sub 2/-O/sub 2/; N/sub 2//sup +/ ions; NO(A/sup 2//spl Sigma//sub u//sup +/) molecules; O/sub 2/; active species concentration; azimuthally symmetric surface wave; band intensities; cold plasma sterilization; emission spectroscopy; low pressure N/sub 2/-O/sub 2/ microwave discharge; medical devices; plasma column; plasma flow rates; plasma pressure; plasma sources; plasma wave; quartz glass tube; spatial position; surgical material; traveling surface waves; Fault location; Glass; Microwave devices; Plasma devices; Plasma materials processing; Plasma sources; Plasma waves; Surface discharges; Surface waves; Surgery;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location
Baltimore, MD, USA
ISSN
0730-9244
Print_ISBN
0-7803-8334-6
Type
conf
DOI
10.1109/PLASMA.2004.1340165
Filename
1340165
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