Title :
Synthesis of ammonia and liquid fuel by CH/sub 4/ and N/sub 2/ plasmas without catalyst at ambient pressure and temperature
Author :
Mindong Bai ; Xiyao Bai ; Ning Wang ; Dongmei Zhang ; Keping Zhan
Author_Institution :
Environ. Eng. Inst., Dalian Maritime Univ., China
Abstract :
Summary form only given. In this paper, we discuss about the synthesis of ammonia and liquid fuel by CH/sub 4/ and N/sub 2/ plasmas without catalyst at ambient pressure and temperature. Key problems of the plasma synthesis: (1) Strong dielectric barrier discharge are formed in micro-gap, which the reduce field is /spl ges/400 Td, the average electron energy is /spl ges/10 eV, and electron density is /spl ges/10/sup 15//cm/sup 3/. (2) The thinner /spl alpha/-Al/sub 2/O/sub 3/ dielectric layers are sprayed on the surface of discharge and earthing electrodes by plasma spraying technology and the the relative dielectric constant is 10. (3) CH/sub 4/ and N/sub 2/ molecules are ionized and dissociated into large numbers of activated pieces. The electron energy requires at least 15.5 eV with the ionization potential of N/sub 2/. (4) The products and the direction of chemistry reaction in the plasma are controlled by the physical parameters such as the discharge power, the applied frequency, the rise rate, the voltage waveform as well as the discharge gap and so on.
Keywords :
alumina; ammonia; dielectric materials; dielectric thin films; discharges (electric); fuel; nitrogen; organic compounds; plasma arc spraying; plasma chemistry; plasma density; plasma dielectric properties; plasma pressure; plasma temperature; /spl alpha/-Al/sub 2/O/sub 3/ dielectric layers; Al/sub 2/O/sub 3/; N/sub 2/; N/sub 2/ molecules; N/sub 2/ plasmas; NH/sub 4/; chemistry reaction; dielectric barrier discharge; dielectric constant; discharge gap; discharge power; earthing electrode; electron density; electron energy; ionization potential; liquid fuel; methane plasmas; plasma spraying technology; plasma synthesis; voltage waveform; Dielectrics; Electrodes; Electrons; Fuels; Grounding; Plasma chemistry; Plasma density; Plasma temperature; Surface discharges; Thermal spraying;
Conference_Titel :
Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-8334-6
DOI :
10.1109/PLASMA.2004.1340195