• DocumentCode
    3512002
  • Title

    The FDTD computation of electromagnetic wave scattering from surfaces

  • Author

    Fu, Kang ; Hsu, Pei-Feng

  • Author_Institution
    Dept. of Mech. & Aerosp. Eng., Florida Inst. of Technol., Melbourne, FL
  • fYear
    2005
  • fDate
    4-7 Oct. 2005
  • Abstract
    The radiative properties of engineering surfaces with microscale surface textures (patterned or random roughness and coating) are of fundamental and practical importance. In the rapid thermal processing or arc/flash-assisted heating of silicon wafers, the control of energy deposition through radiation and the surface temperature measurement using optical pyrometry require in-depth knowledge of the surface radiative properties. These properties are temperature, wavelength, and surface texture dependent. It is important that these properties can be modeled and predicted with reasonable accuracy. This study builds the foundation by solving the Maxwell equations that describe the electromagnetic wave reflection from the one-dimensional random roughness surfaces. The surface height conforms to the normal distribution, i.e., a Gaussian probability density function distribution. The models produce very accurate bi-directional reflectivity with its accuracy limited by the numerical scheme. The numerical algorithm of Maxwell equations´ solution is based on the well-developed finite difference time domain (FDTD) scheme and near-to-far-field transformation. Various computational modeling issues that affect the accuracy of the predicted properties are quantified and discussed. The predicted properties were compared and found in good agreement with the published work
  • Keywords
    Maxwell equations; electromagnetic wave scattering; elemental semiconductors; finite difference time-domain analysis; incoherent light annealing; rapid thermal processing; silicon; surface roughness; Gaussian probability density function distribution; Maxwell equations; Si; arc/flash-assisted heating; bi-directional reflectivity; computational modeling; electromagnetic wave reflection; energy deposition; engineering surfaces; finite difference time domain; microscale surface textures; near-to-far-field transformation; numerical algorithm; one-dimensional random roughness surfaces; optical pyrometry; patterned roughness; radiative properties; rapid thermal processing; silicon wafers; surface radiative properties; surface temperature; Accuracy; Electromagnetic scattering; Finite difference methods; Maxwell equations; Optical surface waves; Rough surfaces; Surface roughness; Surface texture; Surface waves; Time domain analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Thermal Processing of Semiconductors, 2005. RTP 2005. 13th IEEE International Conference on
  • Conference_Location
    Santa Barbara, CA
  • Print_ISBN
    0-7803-9223-X
  • Type

    conf

  • DOI
    10.1109/RTP.2005.1613718
  • Filename
    1613718