• DocumentCode
    3512210
  • Title

    Preferred crystallographic directions of pore propagation in porous silicon layers

  • Author

    Chaung, S. ; Smith, R.L.

  • Author_Institution
    MIT, Cambridge, MA, USA
  • fYear
    1988
  • fDate
    6-9 June 1988
  • Firstpage
    151
  • Lastpage
    153
  • Abstract
    Results are presented that demonstrate that pores propagate along preferred crystallographic directions within both n- and p-type silicon substrates. In addition to this, pores were surprisingly found not to have a round shape. Instead, they are confined by well-defined crystallographic planes. The results from plane-view TEM technique provide quantitative information on the pore size and pore-to-pore distance distributions. These indicate that morphologies are most sensitive to the silicon substrate characteristics.<>
  • Keywords
    crystal morphology; elemental semiconductors; porous materials; silicon; substrates; transmission electron microscope examination of materials; Si substrate; crystallographic planes; morphologies; plane-view TEM; pore propagation; pore size; pore-to-pore distance distributions; preferred crystallographic directions; semiconductors; Crystallography; Current density; Hafnium; Materials science and technology; Semiconductor films; Semiconductor process modeling; Shape; Silicon; Substrates; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE
  • Conference_Location
    Hilton Head Island, SC, USA
  • Type

    conf

  • DOI
    10.1109/SOLSEN.1988.26464
  • Filename
    26464