DocumentCode :
3512210
Title :
Preferred crystallographic directions of pore propagation in porous silicon layers
Author :
Chaung, S. ; Smith, R.L.
Author_Institution :
MIT, Cambridge, MA, USA
fYear :
1988
fDate :
6-9 June 1988
Firstpage :
151
Lastpage :
153
Abstract :
Results are presented that demonstrate that pores propagate along preferred crystallographic directions within both n- and p-type silicon substrates. In addition to this, pores were surprisingly found not to have a round shape. Instead, they are confined by well-defined crystallographic planes. The results from plane-view TEM technique provide quantitative information on the pore size and pore-to-pore distance distributions. These indicate that morphologies are most sensitive to the silicon substrate characteristics.<>
Keywords :
crystal morphology; elemental semiconductors; porous materials; silicon; substrates; transmission electron microscope examination of materials; Si substrate; crystallographic planes; morphologies; plane-view TEM; pore propagation; pore size; pore-to-pore distance distributions; preferred crystallographic directions; semiconductors; Crystallography; Current density; Hafnium; Materials science and technology; Semiconductor films; Semiconductor process modeling; Shape; Silicon; Substrates; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensor and Actuator Workshop, 1988. Technical Digest., IEEE
Conference_Location :
Hilton Head Island, SC, USA
Type :
conf
DOI :
10.1109/SOLSEN.1988.26464
Filename :
26464
Link To Document :
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